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90L100KA1NN60S3S1E03GBA262626 high pressure pump

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90L100KA1NN60S3S1E03GBA262626 high pressure pump

SERIES : 90R/90L
BRAND : Sauer Danfoss
Model Code : 90-L-100-KA-1-NN-60-S-3-S1-E-03-GBA-26-26-26
Model No.ldent No. : 83024824
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    1. Product Details
    2. Applicable Scene

    In the realm of advanced manufacturing and material science, vacuum deposition systems play a critical role in producing high-quality thin films and coatings. These processes are widely used in industries such as electronics, optics, and solar energy. One of the key components that drive the efficiency and effectiveness of these systems is the piston pump. This article explores how piston pumps contribute to high-performance vacuum deposition systems.
    90-L-100-KA-1-NN-60-S-3-S1-E-03-GBA-26-26-26
    90L100KA1NN60S3S1E03GBA262626
    Piston pumps are positive displacement pumps that operate by moving a piston back and forth within a cylinder. This design allows for the precise control of fluid movement, which is essential in applications requiring a high level of vacuum. The ability to achieve and maintain low vacuum levels is crucial for the deposition of materials in a controlled environment, ensuring uniform coating and minimizing contamination.
    90L100 hydraulic pump
    83024824
    One of the primary benefits of using piston pumps in vacuum deposition systems is their robustness and reliability. These pumps are known for their durability and can handle a variety of gases and vapors. This versatility is particularly important in vacuum deposition processes that involve different materials and chemistries. With the capability to operate under varying conditions, piston pumps offer the flexibility needed for diverse applications.
    Moreover, piston pumps provide a high pumping speed, which is key to achieving the fast evacuation of the deposition chamber. Quick evacuation times are essential for reducing the time between deposition cycles, allowing for higher throughput in manufacturing processes. By efficiently removing gases from the chamber, piston pumps help maintain the desired vacuum level, ensuring optimal conditions for deposition.
    Another significant advantage of piston pumps is their ability to create deep vacuums. The low pressure achieved by these pumps is crucial for processes such as physical vapor deposition (PVD) and chemical vapor deposition (CVD), where the presence of residual gases can adversely affect film quality. Piston pumps can maintain stable vacuum environments, which is vital for producing thin films with superior optical and electronic properties.

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